September Optics Expo Exhibits | Focus X Laser Autofocus Microscope System

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2026/09/10

author:adminBOSS

In the quality inspection and observation stages of precision manufacturing, slow autofocus, susceptibility to interference from workpiece shapes, and poor equipment compatibility have long been key challenges hindering production line efficiency. At this year’s Shenzhen Optics Fair, POMEAS is introducing the Focus X Laser Autofocus Microscope System, which offers a new, more stable, and more flexible solution for industrial microscopy inspection scenarios through comprehensive technological upgrades.

 

 

 

Coaxial Laser Autofocus with Millisecond-Level Response, Unaffected by Obstructions

 

 

Focus X features coaxial laser autofocus technology, with a focus cycle of ≤0.4 seconds and support for an output rate of up to 6.5 kHz. This solution fundamentally resolves the common issue of focus obstruction encountered in traditional focusing processes. Whether dealing with stationary workpieces or those moving at a constant speed on a production line, it ensures stable focusing throughout the entire process without the need for repeated manual adjustments, significantly enhancing the smoothness of continuous inspection.

 

 

 

Highly Modular Design for Flexible Integration with Existing Equipment

 

 

The system employs a highly modular architecture, allowing the camera, laser sensor, motion components, and objective modules to be freely configured according to actual needs. More importantly, it supports retrofitting and upgrading customers’ existing microscopy equipment, enabling them to gain laser autofocus capabilities without replacing the entire system. This effectively reduces the investment costs associated with equipment upgrades and allows older equipment to meet new inspection requirements.

 

 

 

Broad Objective Compatibility and Rapid Multi-Objective Switching

 

 

Focus X offers exceptional objective lens compatibility, supporting the full range of 2X–100X APO objectives, as well as rapid switching between multiple objectives via turret or inline configurations. Operators can quickly switch between different magnification levels without manually removing, installing, or adjusting objectives, enabling both wide-field overviews and close-up inspection of fine details, and accommodating multi-step, complex inspection scenarios.

 

 

 

Adaptability to Complex Workpieces, Precise Focusing Even on Special Surfaces

 

 

Designed for the diverse shapes of workpieces found in industrial settings, this system excels at adapting to complex workpieces. It reliably supports focusing on various materials—including metal, ceramic, and mirror-finished surfaces—and can quickly lock onto a clear focus even on special surfaces such as deep holes, inclined surfaces, and curved surfaces that are difficult for traditional focusing solutions to cover, thereby eliminating inspection blind spots.

 

 

 

Excellent Integration Capabilities for Seamless Embedding into Automated Production Lines

 

 

Equipped with both digital and analog output modes, the system is fully compatible with various third-party motion controllers. It can be rapidly integrated into automated production lines and AOI inspection equipment without the need for complex secondary development. Its compact and stable design allows it to easily adapt to existing production line layouts, maintaining the original production rhythm and seamlessly integrating into fully automated inspection processes.

 

 

 

Deployed Across Multiple Industries, Covering Diverse Precision Applications

 

 

Currently, the Focus X Laser Autofocus Microscope System has been successfully deployed in multiple high-end manufacturing sectors. It is widely used in precision inspection processes across industries such as 3C electronics, PCB chips, display glass, semiconductor wafers, and photovoltaics. It is also capable of performing alignment and guidance tasks in laser processing, providing reliable vision-based focusing support for precision operations across various fields.

 

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